Photolithography Supplies: Difference between revisions
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[[Category:PA_SUPPLIES]] | |||
[[Category:Photolithography PCB Fab]] | |||
=Premanufactured= | =Premanufactured= | ||
These | These materials work well... | ||
==Substrate== | ==Substrate== | ||
* [http://www.mouser.com/Tools-Supplies/Prototyping-Products/Copper-Clad-Boards/_/N-b11ou?P=1yzsoajZ1yzvq68 Variety of presensitized copper clad board from mouser.] | * [http://www.mouser.com/Tools-Supplies/Prototyping-Products/Copper-Clad-Boards/_/N-b11ou?P=1yzsoajZ1yzvq68 Variety of presensitized copper clad board from mouser.] [http://www.alliedelec.com/images/products/datasheets/bm/MG_CHEMICALS/70125847.pdf Datasheet.] Specifically recommend 590-660 . | ||
==Developer Chemicals== | ==Developer Chemicals== | ||
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==Developer Chemicals== | ==Developer Chemicals== | ||
* [http://www.amazon.com/Church-03020-Arm-Hammer-Washing/dp/B0029XNTEU/ref=sr_1_1?ie=UTF8&qid=1387395481&sr=8-1&keywords=washing+soda Sodium Carbonate Washing Soda. May not be suitable for processing positive resists.] | * [http://www.amazon.com/Church-03020-Arm-Hammer-Washing/dp/B0029XNTEU/ref=sr_1_1?ie=UTF8&qid=1387395481&sr=8-1&keywords=washing+soda Sodium Carbonate Washing Soda. May not be suitable for processing positive resists.] | ||
Positive developer chemicals apparently use a Sodium Hydroxide and Sodium Silicate mixture. This may reliably permit deep development without overdependent of unexposed regions. | |||
Latest revision as of 00:02, 8 April 2014
Premanufactured
These materials work well...
Substrate
- Variety of presensitized copper clad board from mouser. Datasheet. Specifically recommend 590-660 .
Developer Chemicals
Raw
Starting from raw materials may be cheaper and doable, but has yet to be thoroughly tested.
Substrate
- 5 x 8 Scissor Cut Ultra Thin Copper Clad - Cheap for Photolithographic PCB Fab
- 10x 6x8" Photosensitive Dry Film Sheets
Developer Chemicals
Positive developer chemicals apparently use a Sodium Hydroxide and Sodium Silicate mixture. This may reliably permit deep development without overdependent of unexposed regions.
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